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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 3, 2002, Pages 995-999

Nanophase films deposited from a high-rate, nanoparticle beam

(6) Urban III, F K a Hosseini Tehrani, A a Griffiths, P a Khabari, A a Kim, Y W b Petrov, I b

a FLORIDA INTERNATIONAL UNIVERSITY (United States)

b University of Illinois at Urbana Champaign (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AGGLOMERATION; ALUMINUM; CONDENSATION; COOLING; CRYSTALLIZATION; FILM GROWTH; HELIUM; ION BEAMS; OXYGEN; PRESSURE EFFECTS; RATE CONSTANTS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTER DEPOSITION; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY;

NANOPARTICLE BEAMS; NANOSTRUCTURED FILMS;

NANOSTRUCTURED MATERIALS;

EID: 0035998525 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.1481749 Document Type: Conference Paper

Times cited : (25)

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