Nanophase copper thin films deposited from a beam source

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 4, 1999, Pages 2374-2377

  Urban III, F K ^a   Khabari, A ^a   Hosseini Tehrani, A ^a   Griffiths, P ^a   Fernandez, G ^a  

^a Florida International University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BEAM DIVERGENCE; BEAM SOURCES; CHAMBER WALLS; COPPER THIN FILM; DEPOSITION SYSTEMS; FLORIDA; HIGH RATE; HIGH THROUGHPUT; INTERMEDIATE PRESSURES; LOW RATES; MAXIMUM INTENSITIES; NANO-PHASE; NEW SYSTEM; NONUNIFORM; OFF-AXIS; OPTICALLY TRANSPARENT FILMS; SINGLE CRYSTAL SILICON; SPUTTER SOURCES;

ARGON; HELIUM; PUMPS; SILICON WAFERS; SINGLE CRYSTALS; THIN FILMS; WALLS (STRUCTURAL PARTITIONS);

VAPOR DEPOSITION;

EID: 0001747835     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581915     Document Type: Conference Paper

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