Feasibility study of aluminium nitride formation by nitrogen plasma source ion implantation on aluminium

Materials Science and Engineering: A

Volumn 304-306, Issue 1-2, 2001, Pages 910-913

  Chakraborty, J ^a   Mukherjee, S ^a   Raole, P M ^a   John, P I ^a  

^a INSTITUTE FOR PLASMA RESEARCH   (India)

Author keywords

Aluminium nitride; Nitrogen; Plasma

Indexed keywords

ALUMINUM NITRIDE; ION IMPLANTATION; PLASMA SOURCES; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

NITROGEN PLASMA SOURCES;

MATERIALS SCIENCE;

MICROSTRUCTURE; PHYSICAL PROPERTY;

EID: 0035978571     PISSN: 09215093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5093(00)01643-9     Document Type: Article

References (11)

1. Pavlov P.V., Zorin E.I., Tetelbaum D.I., Lesnikov V.P., Ryzhkov G.M., Pavlov A.V. Phys. Stat. Sol. A. 19:1973;373.
2. Rauschenbach B., Kolitsch A., Richter E. Thin Solid Films. 109:1983;37.
3. Belii I.M., Kamarov F.F., Tishkov U.S., Yankovskii V.M. Phys. Stat. Sol. A. 45:1978;343.
4. Osterle W., Dorfel I., Urban I., Reier T., Schultze J.W. Surf. Coat. Technol. 102:1998;168-174.
5. Bykov V.N., Troyan V.A., Zdorovtseva G.G., Khaimovich V.S. Phys. Stat. Sol. A. 32:1975;53.
6. Blawert C., Mordike B.L. Nucl. Instr. Meth. Phys. Res. B. 127-128:1997;1.
7. Schoser S., Brauchle G., Forget J., Kohlhof K., Weber T., Voigt J., Rauschenbach B. Surf. Coat. Technol. 103-104:1998;222.
8. Mukherjee S., John P.I. Surf. Coat. Technol. 93:1997;188.
9. Raole P.M., Prabhawalkar P.D., Kothari D.C., Pawar P.S., Gogawale S.V. Nucl. Instr. Meth. Phys. Res. B. 23:1987;329.
10. J.F. Zeigler, J. Biersack, V. Littmark, The Stopping Range of Ions in Solids, Vol. 1, Pergamon Press, New York, 1986.
11. L. Guzman, D.C. Kothari, E. Voltolini, P.M. Raole, F. Ferrari, in: P. Vincenzini (Ed.), High Performance Ceramics Films and Coatings, Elsevier, Amsterdam, 1991, p. 565.