Nanosized tin oxide sensitive layer on a silicon platform for domestic gas applications

Sensors and Actuators, B: Chemical

Volumn 78, Issue 1-3, 2001, Pages 83-88

  Fau, P ^a   Sauvan, M ^a   Trautweiler, S ^a   Nayral, C ^b   Erades, L ^b   Maisonnat, A ^b   Chaudret, B ^b  

^a MicroChemical Systems   (Switzerland)

^b LCC LABORATOIRE DE CHIMIE DE COORDINATION   (France)

Author keywords

Carbon monoxide; Gas sensor; Methane; Nanoparticles; Tin dioxide

Indexed keywords

CARBON DIOXIDE; DEPOSITION; DIELECTRIC FILMS; METHANE; MICROMACHINING; NANOSTRUCTURED MATERIALS; PASSIVATION; SEMICONDUCTING SILICON; SEMICONDUCTING TIN COMPOUNDS; SENSITIVITY ANALYSIS; SUBSTRATES; THERMAL INSULATION; THIN FILMS;

DROP DEPOSITION;

CHEMICAL SENSORS;

EID: 0035975060     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-4005(01)00793-6     Document Type: Article

References (13)

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8. 2 for the sensitive layers of gas sensors