Dissociation process of CH4/H2 gas mixture during EACVD

Thin Solid Films

Volumn 390, Issue 1-2, 2001, Pages 93-97

  Dong, Lifang ^a   Chen, Junying ^a   Li, Xiaowei ^a   Zhang, Lianshui ^a   Han, Li ^a   Fu, Guangsheng ^a  

^a HEBEI UNIVERSITY   (China)

Author keywords

CH4 H2 gas mixture; Dissociation process; EACVD

Indexed keywords

COMPUTER SIMULATION; DISSOCIATION; ELECTRONS; HYDRIDES; METHANE; MIXTURES; MONTE CARLO METHODS;

ELECTRON ENHANCED CHEMICAL VAPOR DEPOSITION (EACVD);

CHEMICAL VAPOR DEPOSITION;

EID: 0035973353     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)00944-0     Document Type: Article

References (19)