Low-pressure chemical vapour deposition of diamond films in a radio-frequency-plasma-assisted hot-filament reactor

Diamond and Related Materials

Volumn 7, Issue 10, 1998, Pages 1526-1533

  Pai, M P ^a   Musale, D V ^a   Kshirsagar, S T ^a  

^a NATIONAL CHEMICAL LABORATORY   (India)

Author keywords

CVD; Diamond; Glow discharge; Raman scattering

Indexed keywords

DIAMOND; ELECTRODE; FILM; GROWTH RATE; HYBRIDIZATION; HYDROGEN; METHANE; REACTOR; VAPOR;

CHEMICAL VAPOR DEPOSITION; ETCHING; FILM GROWTH; GLOW DISCHARGES; HYDROGEN; ION BOMBARDMENT; METHANE; MORPHOLOGY; PLASMA APPLICATIONS; RAMAN SPECTROSCOPY;

LOW PRESSURE CHEMICAL VAPOR DEPOSITION; RADIO FREQUENCY PLASMA ASSISTED HOT FILAMENT REACTOR;

DIAMOND FILMS;

DIAMOND COATING;

EID: 0032194808     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(98)00226-X     Document Type: Article

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