Pulsed high energy density plasma processing silicon surface

Thin Solid Films

Volumn 390, Issue 1-2, 2001, Pages 149-153

  Liu, Bin ^a   Liu, Chizi ^a   Cheng, Dajung ^a   He, Rui ^a   Yang, Si Ze ^a,b  

^a INSTITUTE OF PHYSICS   (China)

^b DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Pulsed high energy density plasma; Surface processing; Titanium silicide

Indexed keywords

DEPOSITION; FILM PREPARATION; PLASMA APPLICATIONS; QUENCHING; SEMICONDUCTING SILICON; TITANIUM COMPOUNDS;

TITANIUM SILICIDE;

SURFACE TREATMENT;

EID: 0035973318     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)00927-0     Document Type: Article

References (10)