Investigation of titanium coating on Si3N4 by using a pulsed high energy density plasma (PHEDP) gun

Materials Chemistry and Physics

Volumn 57, Issue 3, 1999, Pages 219-223

  Liu, Bin ^a   Zhang, J Z ^b   Chen, H F ^c   Jiang, B Y ^a   Ren, Y F ^a   Yang, Si Ze ^a  

^a INSTITUTE OF PHYSICS   (China)

^b TSINGHUA UNIVERSITY   (China)

^c PEKING UNIVERSITY   (China)

Author keywords

PHEDP gun; Si3N4; Titanium film

Indexed keywords

ATOMIC FORCE MICROSCOPY; CERAMIC MATERIALS; DEPOSITION; MORPHOLOGY; PLASMA GUNS; SCANNING ELECTRON MICROSCOPY; SILICON NITRIDE; TITANIUM; X RAY DIFFRACTION ANALYSIS;

PULSED HIGH ENERGY DENSITY PLASMA (PHEDP) GUNS;

METALLIC FILMS;

EID: 0032651687     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0254-0584(98)00219-3     Document Type: Article

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