Preparation and characterization of copolymers containing (+)-bornyl methacrylate and their racemate for positive-tone photoresist

Journal of Applied Polymer Science

Volumn 81, Issue 14, 2001, Pages 3538-3544

  Liu, Jui Hsiang ^a   Shih, Jen Chieh ^a   Shih, Chih Hung ^a   Chen, Wei Ting ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Bornyl methacrylate; Chiral; Diastereomer; Enantiomer; Photoacid generator; Photoresist

Indexed keywords

ACRYLICS; COMPOSITION; GLASS TRANSITION; MOLECULAR WEIGHT; MONOMERS; PHOTOCHEMICAL REACTIONS; PHOTORESISTS; SYNTHESIS (CHEMICAL); TEMPERATURE; THERMODYNAMIC STABILITY; THERMOGRAVIMETRIC ANALYSIS;

BORNYL METHACRYLATE; CHIRAL; DIASTEREOMER; ENANTIOMER; PHOTOACID GENERATOR; POSITIVE TONE PHOTORESIST; TERTBUTYL METHACRYLATE;

COPOLYMERS;

CHEMICAL; COPOLYMER; PHYSICAL PROPERTY; PREPARATION;

EID: 0035968654     PISSN: 00218995     EISSN: None     Source Type: Journal    
DOI: 10.1002/app.1810     Document Type: Article

References (17)