Tantalum oxide as an alternative low height tunnel barrier in magnetic junctions

Applied Physics Letters

Volumn 78, Issue 21, 2001, Pages 3274-3276

  Rottlander P ^a   Hehn, M ^a   Lenoble, O ^a   Schuhl, A ^a  

^a CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035927070     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1374223     Document Type: Article

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