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Modern Physics Letters B

Volumn 15, Issue 28-29, 2001, Pages 1332-1338

Probing for fluorine in nitrided SiO2 films by ion beam analysis

(4) Kennedy, V John a Markwitz, Andreas a White, G V b Brown, I W M b

a GNS SCIENCE (New Zealand)

b CALLAGHAN INNOVATION (New Zealand)

Author keywords

[No Author keywords available]

Indexed keywords

FLUORINE; SILICON DIOXIDE;

ANALYTIC METHOD; ANODIC STRIPPING POTENTIOMETRY; BEAM THERAPY; CONFERENCE PAPER; FILM; NUCLEAR REACTOR; PHASE SEPARATION; SAMPLING;

EID: 0035924747 PISSN: 02179849 EISSN: None Source Type: Journal
DOI: 10.1142/S021798490100324X Document Type: Conference Paper

Times cited : (4)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.