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Volumn 13, Issue 12-13, 2001, Pages 1027-1030

Nitridation of silicon oxide layers studied with ion beam analysis on the nanometer scale

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; HIGH TEMPERATURE PROPERTIES; NITROGEN; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SURFACES; THICKNESS MEASUREMENT;

EID: 0035806587     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-4095(200107)13:12/13<1027::AID-ADMA1027>3.0.CO;2-S     Document Type: Article
Times cited : (6)

References (14)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.