Photoluminescence from amorphous silicon oxide films prepared by HFCVD technique

Modern Physics Letters B

Volumn 15, Issue 17-19, 2001, Pages 756-759

  Salazar, P ^a   Chavez F ^a   Silva Andrade, F ^a   Ilinskii, A V ^a   Morales, N ^a   Pena Sierra R ^b  

^a BENEMÉRITA UNIVERSIDAD AUTÓNOMA DE PUEBLA   (Mexico)

^b DEPARTAMENTO DE FÍSICA   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

HYDROGEN; HYDROXYL GROUP; OXIDE; OXYGEN; SILICON DERIVATIVE;

CONFERENCE PAPER; FILM; INFRARED SPECTROSCOPY; PHOTOLUMINESCENCE; SEMICONDUCTOR; TECHNIQUE;

EID: 0035921455     PISSN: 02179849     EISSN: None     Source Type: Journal    
DOI: 10.1142/S0217984901002476     Document Type: Conference Paper

References (2)