Hot-filament-enhanced chemical vapor deposition of silicon oxide films

Materials Letters

Volumn 43, Issue 5, 2000, Pages 324-328

  Chavez F ^a   Bravo Garcia Y E ^b   Silva Andrade, F ^a   Galindo, A ^b  

^a Apdo Postal 207 72000   (Mexico)

^b BENEMÉRITA UNIVERSIDAD AUTÓNOMA DE PUEBLA   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; HYDROGEN; INFRARED SPECTROSCOPY; SEMICONDUCTING GALLIUM ARSENIDE; SILICA;

HOT-FILAMENT-ENHANCED CHEMICAL VAPOR DEPOSITION (HF-CVD);

AMORPHOUS FILMS;

EID: 0343391155     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(99)00282-7     Document Type: Article

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