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Applied Surface Science

Volumn 174, Issue 2, 2001, Pages 138-147

Field electron emission study of Ti and Hf adsorption layers on W

(3) Szczudło, Zbigniew a Ciszewski, Antoni a Losovyj, Yaroslav B b

a UNIVERSITY OF WROC AW (Poland)

b IVAN FRANKO NATIONAL UNIVERSITY OF LVIV (Ukraine)

Author keywords

Adsorption; Crystal growth; Field electron emission microscopy (FEM) techniques; Hafnium (Hf); Nucleation; Titanium (Ti)

Indexed keywords

ADSORPTION; CRYSTAL GROWTH; ELECTRON EMISSION; ELECTRON MICROSCOPY; HAFNIUM; NUCLEATION; TITANIUM; TUNGSTEN; VACUUM APPLICATIONS;

INTERSOLUBILITY;

SURFACE CHEMISTRY;

EID: 0035897239 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(01)00024-1 Document Type: Article

Times cited : (10)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.