Work function changes in Hf/W(011) and Hf/W(001) adsorption systems

Surface Science

Volumn 454, Issue 1, 2000, Pages 122-126

  Ciszewski, Antoni ^a   Szczudlo, Zbigniew ^a   Losovyi, Yaroslav ^a,b  

^a UNIVERSITY OF WROC AW   (Poland)

^b IVAN FRANKO NATIONAL UNIVERSITY OF LVIV   (Ukraine)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ANNEALING; DIODES; ELECTRIC POTENTIAL; HAFNIUM; INTERFACES (MATERIALS); INTERMETALLICS; LOW ENERGY ELECTRON DIFFRACTION; SEGREGATION (METALLOGRAPHY); SINGLE CRYSTALS; SURFACE PHENOMENA;

LOW INDEX SINGLE CRYSTAL SURFACES; WORK FUNCTION;

TUNGSTEN;

EID: 0033683488     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(00)00187-4     Document Type: Article

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