Photoemission study of the effect of thermal annealing on Cs2O/Si(111) surfaces

Journal of Applied Physics

Volumn 90, Issue 8, 2001, Pages 3787-3791

  Wu, J X ^a   Li, F Q ^a   Zhu, J S ^a   Ji, M R ^a   Ma, M S ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035886151     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1405133     Document Type: Article

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