Mechanisms responsible for the ultraviolet photosensitivity of SnO2-doped silica

Physical Review B - Condensed Matter and Materials Physics

Volumn 64, Issue 7, 2001, Pages 731021-731023

  Chiodini, N ^a   Ghidini, S ^a   Paleari, A ^a  

^a UNIVERSITY OF MILANO BICOCCA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

NEODYMIUM; OXIDE; OXYGEN; SILICON DIOXIDE; TIN DERIVATIVE;

ABSORPTION SPECTROPHOTOMETRY; ARTICLE; BLEACHING; DENSITY; ELECTRON SPIN RESONANCE; MEASUREMENT; NEODYMIUM LASER; PHOTOSENSITIVITY; REFRACTION INDEX; TIME; ULTRAVIOLET RADIATION;

EID: 0035881383     PISSN: 01631829     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (18)