Statistical analysis of multiple cracking phenomenon of a SiOx thin film on a polymer substrate

Journal of Applied Physics

Volumn 90, Issue 2, 2001, Pages 713-719

  Yanaka, M ^a   Tsukahara, Y ^a   Okabe, T ^b   Takeda, N ^b  

^a TOPPAN PRINTING CO LTD   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035879020     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1379355     Document Type: Article

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