A novel methodology for the manufacturability of robust CMOS semiconductor gas sensor arrays

Sensors and Actuators, B: Chemical

Volumn 77, Issue 1-2, 2001, Pages 395-400

  Gotz A ^a   Gracia I ^a   Plaza, J A ^a   Cane C ^a   Roetsch, P ^b   Bottner H ^b   Seibert, K ^b  

^a INSTITUTO DE MICROELECTRÓNICA DE BARCELONA   (Spain)

^b FRAUNHOFER INSTITUTE FOR PHYSICAL MEASUREMENT TECHNIQUES IPM   (Germany)

Author keywords

Gas sensors; Low power; Micromachining; Robustness

Indexed keywords

ARRAYS; CMOS INTEGRATED CIRCUITS; MICROMACHINING; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE STRUCTURES; SILICON SENSORS;

SEMICONDUCTOR GAS SENSOR ARRAYS;

CHEMICAL SENSORS;

EID: 0035875728     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-4005(01)00701-8     Document Type: Article

References (6)

1. An integrated low-power thin film CO gas sensors on Si
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3. Integrated ultra-thin-film gas sensors
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5. A micromachined solid state integrated gas sensor for the detection of aromatic hydrocarbons
6. Maskless anisotropic etching - A novel micromachining technology for multilevel microstructures