Inductively coupled plasma application to the resist ashing

Thin Solid Films

Volumn 386, Issue 2, 2001, Pages 160-164

  Takagi, Ken ichi ^a   Ikeda, Akihiro ^a   Fujimura, Tsuyoshi ^a   Kuroki, Yukinori ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

Ashing; Flat band voltage; ICP

Indexed keywords

ELECTRIC POTENTIAL; ENERGY ABSORPTION; INDUCTIVELY COUPLED PLASMA; MAGNETIC FIELD MEASUREMENT; PRESSURE EFFECTS; SUBSTRATES;

FLAT BAND VOLTAGE;

PLASMA SOURCES;

EID: 0035874093     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01636-9     Document Type: Article

References (5)

1. th International Symp. on Plasma Processing