Initial stages of porous Si formation on Si surfaces investigated by infrared spectroscopy

Applied Surface Science

Volumn 175-176, Issue , 2001, Pages 157-162

  Kimura, Yasuo ^a   Kondo, Yusuke ^a   Niwano, Michio ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Electrochemical etching; Infrared absorption; Monte Carlo simulation; Porous Si

Indexed keywords

ABSORPTION SPECTROSCOPY; ANODIC OXIDATION; CRYSTALLOGRAPHY; ELECTRODES; ETCHING; HYDROFLUORIC ACID; INFRARED SPECTROSCOPY; MONTE CARLO METHODS;

ATOMIC BONDING; ELECTROCHEMICAL ETCHING;

POROUS SILICON;

EID: 0035873405     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00029-0     Document Type: Article

References (12)

1. Canham L.T. Appl. Phys. Lett. 57:1990;1046.
2. Parkhutik V. Solid-State Electron. 43:1999;1121.
3. Hirschman K.D., Tsybeskov L., Duttagupta S.P., Fauchet P.M. Nature. 384:1996;338.
4. Nakagawa K., Nishida A., Shimada T., Yamaguchi H., Eguchi K. Jpn. J. Appl. Phys. 31:1992;L515.
5. Tsai C., Li K.-H., Kinosky D.S., Qian R.-Z., Hsu T.-C., Irby J.T., Banerjee S.K., Tasch A.F., Campbell C., Hance B.K., White J.M. Appl. Phys. Lett. 60:1992;1700.
6. Belogorokhov A.I., Enderlein R., Tabata A., Leite J.R. Phys. Rev. B. 56:1997;10276.
7. Aleksandorov L.N., Novikov P.L. Thin Solid Films. 330:1998;102.
8. Allongue P., Henry de Villeneuve C., Bernard M.C., Péou J.E., Boutry-Forveille A., Lévy-Clément C. Thin Solid Films. 297:1997;1.
9. Carstensen J., Christphersen M., Foll H. Mater. Sci. Eng. B. 69/70:2000;23.
10. Jakob P., Chabal Y.J., Kuhnke K., Christman S.B. Surf. Sci. 302:1994;49.
11. Watanabe S. Appl. Surf. Sci. 130-132:1998;213.
12. Watanabe S. Surf. Sci. 415:1998;385.