New photocuring resin using fullerene as a photosensitizer

Synthetic Metals

Volumn 121, Issue 1-3, 2001, Pages 1167-1168

  Tajima, Y ^a   Shigemitsu, Y ^a   Arai, H ^a   Takeuchi, E ^a   Takeuchi, K ^a  

^a INST OF PHYS AND CHEMICAL RESEARCH   (Japan)

Author keywords

Bi continuous polymer network interface; Coatings; Fullerenes and derivatives; Gel processing; Insulating films

Indexed keywords

ANNEALING; CURING; DERIVATIVES; FULLERENES; FURAN RESINS; GELS; HEAT RESISTANCE; INTERFACES (MATERIALS); PHOTOOXIDATION; PHOTOSENSITIVITY; PHOTOSENSITIZERS; PLASTIC COATINGS; PLASTIC FILMS; POLYCONDENSATION; THERMODYNAMIC STABILITY;

PHOTOCURING; PHOTOOXIDATION INDUCED POLYCONDENSATION (POP);

POLYIMIDES;

EID: 0035867483     PISSN: 03796779     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0379-6779(00)01198-X     Document Type: Article

References (5)

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3. A. A. Krasnovsky, J. Photochem. Photobiol., 29 (1979) 29.
4. Y. Shigemitsu, Y. Tajima, K. Takeuchi, Synthesis, to be submitted.
5. M. Berrada, F. Carriere, B. Coutin, P. Monjol, H. Sekiguchi, R. Mercier, Chem. Mater., 8 (1996) 1029.