Application of a furan-containing polymer/fullerene system to photolithography

Polymer Journal

Volumn 29, Issue 12, 1997, Pages 1016-1019

  Tajima, Yusuke ^a,b   Tezuka, Yoshihiko ^a   Ishii, Tadahiro ^a   Takeuchi, Kazuo ^b  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

^b INST OF PHYS AND CHEMICAL RESEARCH   (Japan)

Author keywords

Fullerene; Furan Containing Polymer; Gelation; Photolithography; Photooxygcnation; Photoresist; Singlet Oxygen

Indexed keywords

CROSSLINKING; ELECTRON ENERGY LEVELS; ELECTRON TRANSITIONS; FULLERENES; GELATION; PHOTOCHEMICAL REACTIONS; PHOTORESISTS; POLYCONDENSATION; REACTION KINETICS; SOLIDIFICATION;

PHOTOOXYGENATION;

FURAN RESINS;

EID: 0031385588     PISSN: 00323896     EISSN: None     Source Type: Journal    
DOI: 10.1295/polymj.29.1016     Document Type: Article

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