Effect of silicon on the microstructure of pulsed laser ablated ferroelectric PbTiO3 thin films

Journal of Physics D: Applied Physics

Volumn 34, Issue 7, 2001, Pages 1037-1043

  Banerjee, R ^a   Purandare, S C ^a   Palkar, V R ^a   Pinto, R ^a  

^a TATA INSTITUTE OF FUNDAMENTAL RESEARCH   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ABLATION; AMORPHOUS MATERIALS; DEPOSITION; FERROELECTRIC MATERIALS; INTERFACES (MATERIALS); MICROSTRUCTURE; PEROVSKITE; PULSED LASER APPLICATIONS; SILICON; SUBSTRATES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

LEAD TITANATE THIN FILM; PULSED LASER ABLATION; SILICON EFFECT;

LEAD COMPOUNDS;

EID: 0035820246     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/34/7/303     Document Type: Article

References (10)