Properties of graded TiCx Ny coating deposited by a low-temperature HCD ion coating technique

Surface and Coatings Technology

Volumn 141, Issue 1, 2001, Pages 78-87

  Yang, Y S ^a   Lee, S C ^a   Tsao, C Y A ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Graded film; Hollow cathode deposition (HCD); Physical vapor deposition (PVD); TiCn

Indexed keywords

MICROHARDNESS; MICROSTRUCTURE; SCANNING ELECTRON MICROSCOPY; THIN FILMS; TITANIUM COMPOUNDS; TOOL STEEL; X RAY DIFFRACTION;

CRYSTAL PHASES;

COATING TECHNIQUES;

COATING; FILM; HARDNESS; MICROSTRUCTURE; TITANIUM CARBIDE;

EID: 0035806069     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01035-0     Document Type: Article

References (21)