Gas phase analysis of TiCl4 plasma processes by molecular beam mass spectrometry

Surface and Coatings Technology

Volumn 148, Issue 2-3, 2001, Pages 256-261

  Wierda, Derk Andrew ^a,b   Reddy, Chandra M ^a   Amato Wierda, Carmela C ^a  

^a UNIVERSITY OF NEW HAMPSHIRE   (United States)

^b SAINT ANSELM COLLEGE   (United States)

Author keywords

Molecular beam mass spectrometry; Plasma enhanced chemical vapor deposition; TiCl4; TiCN; TiN thin films

Indexed keywords

CHEMICAL REACTORS; IONS; MASS SPECTROMETRY; MOLECULAR BEAMS; PHASE COMPOSITION; PRESSURE EFFECTS; TITANIUM COMPOUNDS;

GAS PHASE ANALYSIS;

PLASMAS;

PLASMA TREATMENT;

EID: 0035803942     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01343-3     Document Type: Article

References (21)

1. Plasma assisted chemical vapor deposition
2. Protective coatings