Stoichiometry determination of VOx thin films by 18O-RBS spectrometry

Thin Solid Films

Volumn 400, Issue 1-2, 2001, Pages 120-124

  Rata, A D ^a   Vongtragool, S ^a   Boerma, D O ^a   Hibma, T ^a  

^a UNIVERSITY OF GRONINGEN   (Netherlands)

Author keywords

Epitaxy; MBE UHV; RBS; Stoichiometry; Vanadium oxide

Indexed keywords

EPITAXIAL GROWTH; FILM GROWTH; LOW ENERGY ELECTRON DIFFRACTION; MAGNESIA; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SPECTROMETRY; STOICHIOMETRY; SUBSTRATES; VANADIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

RUTHERFORD BACKSCATTERING SPECTROMETRUY;

THIN FILMS;

EID: 0035803183     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)01470-5     Document Type: Article

References (8)