Proposal of catalytic chemical sputtering method and its application to prepare large grain size poly-Si

Thin Solid Films

Volumn 395, Issue 1-2, 2001, Pages 169-172

  Kamesaki, Koji ^a   Masuda, Atsushi ^a   Izumi, Akira ^a   Matsumura, Hideki ^a  

^a JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

Catalytic chemical sputtering; Grain size; Incubation time; Polycrystalline silicon; Seed layer

Indexed keywords

CATALYTIC CRACKING; GRAIN SIZE AND SHAPE; HYDROGEN; QUARTZ; RAMAN SPECTROSCOPY; SILANES; SPUTTER DEPOSITION; SUBSTRATES; THERMAL EFFECTS;

CATALYTIC CHEMICAL SPUTTERING METHOD;

POLYSILICON;

EID: 0035801169     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)01252-4     Document Type: Conference Paper

References (3)