Formation of silicon films for solar cells by the Cat-CVD method

Thin Solid Films

Volumn 395, Issue 1-2, 2001, Pages 198-201

  Komoda, Manabu ^b   Kamesaki, Koji ^a   Masuda, Atsushi ^a   Matsumura, Hideki ^a  

^a JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

^b KYOCERA CORPORATION   (Japan)

Author keywords

Catalytic chemical vapor deposition (Cat CVD); Hot wire chemical vapor deposition; Poly Si; Solar cell

Indexed keywords

CATALYST ACTIVITY; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; FILM GROWTH; GRAIN SIZE AND SHAPE; POLYSILICON; RATE CONSTANTS; SILICON SOLAR CELLS;

HOT-WIRE CHEMICAL VAPOR DEPOSITION (HWCVD);

THIN FILMS;

EID: 0035801099     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)01257-3     Document Type: Conference Paper

References (8)