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Volumn 395, Issue 1-2, 2001, Pages 66-70

Hot-wire CVD growth simulation for thickness uniformity

Author keywords

Chemical vapor deposition; Computer simulation; Solar cells; Thickness uniformity

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; FILM GROWTH; SUBSTRATES; THICKNESS CONTROL;

EID: 0035801048     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)01209-3     Document Type: Conference Paper
Times cited : (8)

References (5)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.