Deposition of device quality amorphous silicon by hot-wire CVD

Materials Research Society Symposium - Proceedings

Volumn 467, Issue , 1997, Pages 645-650

  Feenstra, K F ^a   Van Der Werf, C H M ^a   Molenbroek, E C ^a   Schropp, R E I ^a  

^a UTRECHT UNIVERSITY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; ELECTRIC PROPERTIES; ELECTRONIC DENSITY OF STATES; GLOW DISCHARGES; SOLAR CELLS; SUBSTRATES;

CONSTANT PHOTOCURRENT METHOD; HOT WIRE CHEMICAL VAPOR DEPOSITION; HYDROGENATED AMORPHOUS SILICON; LIGHT INDUCED DEGRADATION; THERMALLY STIMULATED CONDUCTIVITY;

AMORPHOUS FILMS;

EID: 0031356360     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-467-645     Document Type: Conference Paper

References (6)