Hot-wire CVD-grown microcrystalline silicon films with and without initial growing layer modification by transformer-coupled plasma

Thin Solid Films

Volumn 395, Issue 1-2, 2001, Pages 184-187

  Kim, D Y ^a   Ahn, B J ^a   Moon, S I ^a   Yi, J ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

Crystallinity; Hot wire chemical vapor deposition (HWCVD); Microcrystalline silicon ( c Si); Transformer coupled plasma chemical vapor deposition

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL MICROSTRUCTURE; CRYSTALLINE MATERIALS; ELECTRIC WIRE; EVAPORATION; FILM GROWTH; PLASMA APPLICATIONS; SEMICONDUCTING SILICON; VOLUME FRACTION;

HOT WIRE CHEMICAL VAPOR DEPOSITION (HWCVD); MICROCRYSTALLINE SILICON FILMS; PLASMA TREATMENT;

THIN FILMS;

EID: 0035800993     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)01248-2     Document Type: Conference Paper

References (5)