High temperature chemical vapor deposition of silicon on Fe(100)

Applied Surface Science

Volumn 178, Issue 1-4, 2001, Pages 194-200

  Rebhan, M ^a,d   Meier, R ^a,b   Plagge, A ^a   Rohwerder, M ^a,c   Stratmann, M ^a,c  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

^b MALVERN INSTRUMENTS LTD   (United Kingdom)

^c MAX PLANCK INSTITUT FÜR EISENFORSCHUNG GMBH   (Germany)

^d SIEMENS AG   (Germany)

Author keywords

Chemical vapor deposition; Dendritic growth; Diffusion; Iron silicides; Nucleation

Indexed keywords

ADHESION; CHEMICAL VAPOR DEPOSITION; DIFFUSION IN SOLIDS; IRON; MOLECULAR STRUCTURE; MORPHOLOGY; OXIDATION; PARTIAL PRESSURE; PASSIVATION; PLASTIC COATINGS; REACTION KINETICS; SILANES;

DENDRITIC GROWTH;

SILICON;

EID: 0035797036     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00323-3     Document Type: Article

References (24)