CVD of silicon and silicides on iron

Applied Surface Science

Volumn 140, Issue 1-2, 1999, Pages 99-105

  Rebhan, M ^a   Rohwerder, M ^a   Stratmann, M ^a  

^a Inst Werkstoffwissenschaften 4   (Germany)

Author keywords

CVD process; Iron silicides; Silicon

Indexed keywords

ADHESION; ADSORPTION; FILM GROWTH; IRON COMPOUNDS; SILICON; SILICON COMPOUNDS;

ADHESION PROMOTERS; SILICIDES;

CHEMICAL VAPOR DEPOSITION;

EID: 0033076079     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00500-5     Document Type: Article

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