Reticle defect size calibration using low voltage SEM and pattern recognition techniques for sub-200 nm defects

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3873 (I, Issue , 1999, Pages 651-658

  Zurbrick, Larry ^a   Khanna, Steve ^a   Lee, Jay ^a   Greed, Jim ^a   Laird, Ellen ^a   Blanquies, Rene ^a  

^a KLA TENCOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CALIBRATION; IMAGE ANALYSIS; INSPECTION; MASKS; PATTERN RECOGNITION; PRECISION ENGINEERING; QUALITY CONTROL; SCANNING ELECTRON MICROSCOPY;

AUTOMATIC DEFECT INSPECTION; PROGRAMMED DEFECT RETICLES;

PHOTOLITHOGRAPHY;

EID: 0033352898     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.373361     Document Type: Conference Paper

References (1)