Properties of electrochromic nickel-vanadium oxide films sputter-deposited from non-magnetic alloy target

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4458, Issue , 2001, Pages 154-163

  Avendaño, Esteban ^a   Azens, Andris ^a   Niklasson, Gunnar ^a  

^a UPPSALA UNIVERSITY   (Sweden)

Author keywords

DC reactive sputtering; Electrochromic; Nickel vanadium oxide; Thin films

Indexed keywords

ARGON; COMPOSITION; CRYSTAL STRUCTURE; DIFFUSION IN SOLIDS; ELECTROCHROMISM; FLOW OF FLUIDS; HYDROGEN; MAGNETRON SPUTTERING; NICKEL COMPOUNDS; OXYGEN; POLYCRYSTALLINE MATERIALS; SPUTTER DEPOSITION;

CYCLING STABILITY; ELECTROCHROMIC NICKEL-VANADIUM OXIDE FILM; GALVANOSTATIC INTERMITTENT TITRATION TECHNIQUE; POLYCRYSTALLINE FILM;

THIN FILMS;

EID: 0035763057     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.448243     Document Type: Conference Paper

References (19)

1. W. Estrada, A.M. Andersson and C.G. Granqvist, "Electrochromic nickel-oxide-based coatings made by reactive dc magnetron sputtering: Preparation and optical properties", Journal of Applied Physics, 64, pp. 3678-3683, 1988.
2. J.S.E.M. Svensson and C.G. Granqvist, "Optical properties of electrochromic hydrated nickel oxide coatings made by rf sputtering", Applied Optics, 26, pp 1554-1556, 1987.
3. C.G. Granqvist, Handbook of inorganic Electrochromic Materials, Chapter 19, Elsevier, Amsterdam, 1995.
4. M. Kitao, K. Izawa and S. Yamada, "Electrochromic properties of nickel oxide films prepared by introduction into sputtering atmosphere", Solar Energy Materials and Solar Cells, 39, pp. 115-122, 1995.
5. K. Yoshimura, T Miki and S. Tanemura, "Nickel oxide electrochromic thin films prepared by reactive DC magnetron sputtering", Japanese Journal of Applied Physics, 34, pp. 2440-2446, 1995.
6. A. Azens, L. Kullman, G. Vaivars, H. Nordborg and C.G. Granqvist, "Sputter-deposited nickel oxide for electrochromic applications", Solid State Ionics, 113-115, pp. 449-456, 1998.
7. F.F. Ferreira, M.H. Tabacniks, M.C.A. Fantini, I.C. Faria and A. Gorenstein, "Electrochromic nickel oxide thin films deposited under different sputtering conditions", Solid State Ionics, 86-88, pp. 971-976, 1996.
8. I.C. Faria, M. Kleinke, A. Gorenstein, M.C.A. Fantini and M.H. Tabacniks, "Toward efficient electrochromic NiO films: A study of Microstructure, morphology and Stoichiometric of radio frequency sputtered films", Journal of Electrochemical Society, 145, pp. 235-240, 1998.
9. K. Bange "Nickel oxide and hydrous nickel oxide" in H. Bach and D. Krause (Eds.), Thin films on glass, Chapter 4, Springer-Verlag, Berlin, 1997.
10. Powders Diffraction Files No. 47-1049. International Centre for Diffraction Data, 1998.
11. T.W. Baker, "X-ray diffraction" in T. Mulvey and R.K. Websto (Eds.), Modern Physics in Material. Technology, Chapter 2, Oxford University Press, London, 1974.
12. G.K. Williamson and W.H. Hall, "X-ray line broadening from filed Aluminium and wolfram", Acta Metallurgica, 1, pp. 22-31, 1953.
13. B.E. Warren, X-ray diffraction, Chapter 13, Dover, New York, 1990.
14. A. Guinier, X-ray diffraction in crystals, imperfect crystals, and amorphous bodies, Chapter 5, Dover, New York, 1994.
15. E.L. Miller and K.E. Rocheleau, "Electrochemical and electrochromic behaviour of reactive sputtered nickel oxide", Journal of Electrochemical Society, 144, pp. 1995-2003, 1997.
16. D.A Wruck and M. Rubin, "Structure and electronic properties of electrochromic NiO films", Journal of Electrochemical Society, 140, pp. 1097-1104, 1993.
17. 3Sb", Journal of Electrochemical Society, 124, pp. 1569-1578, 1977.
18. Y.G. Wu, G.M. Wu, X.Y. Ni and X. Wu, "Ion transport in electrochromic nickel oxide thin films", Solar Energy Materials and Solar Cells Vol. 63, pp. 217-226, 2000.
19. W.R. McKinnon and R.R. Haering "Physical mechanics of intercalation" in R.E. White, J.O'M. Bockris and B.E. Conway (Eds.), Modern aspects of electrochemistry No. 15, Chapter 4, Plenum Press, London, 1983.