Deep reactive ion etching of silica for planar lightwave circuits using indigenously developed ECR/RIE system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4417, Issue , 2001, Pages 267-270

  Pachauri, J P ^a   Baby, Aji ^a   Chaturvedi, N ^a   Kothari, H S ^a   Singh, Awatar ^a   Singh, B R ^a   Dixit, P N ^b   Bhattacharya, R ^b  

^a CENTRAL ELECTRONICS ENGINEERING RESEARCH INSTITUTE   (India)

^b NATIONAL PHYSICAL LABORATORY   (India)

Author keywords

Electron Cyclotron Resonance; Planar Lightwave circuits; Reactive Ion Etching; Silica Glass Film; Splitter

Indexed keywords

ELECTRON CYCLOTRON RESONANCE; FLUOROCARBONS; OPTICAL FIBERS; OPTICAL WAVEGUIDES; OPTIMIZATION; REACTIVE ION ETCHING; SILICA;

PLANAR LIGHTWAVE CIRCUITS;

OPTOELECTRONIC DEVICES;

EID: 0035759756     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.441305     Document Type: Article

References (8)

1. Tetsuo Miya, "Silica-based planar lightwave circuits: passive and thermally active devicse", IEEE Journal of selected topics in quantum electronics, Vol. 6 No.1 (2000), pp 38-45.
2. B.R. Singh, "Silica-based planar lightwave circuits for wave length division multiplexing (WDM) applications", International conference on fiber optics and photonics, dec 14-18, 1998, IIT.Delhi, pp 659-664.
3. Senichi Suzuki; "Recent progress on silica -based planar lightwave circuits", International conference on fiber optics and photonics, dec 14-18, 1998, IIT.Delhi, pp 653-58.
4. K. Suzuki, S. Okudaira, N. Sakudo and I. Kanomata, "Microwave plasma etching", Jpn. J. Appl. Phy., 16, 1979 (1977).
5. R.W. Boswall, A.J. Perry and M. Emami, "Multipole confined diffusion plasma produced by 13.56 Mhz electrodeless source", J. Vac. Sci. Techonol. A7, 3345, (1989).
6. K. Tsujimoto, T. Kumihashi and S. Tachi, "Novel short-gas residence-time electroncyclotron resonance plasma etching", Appl. Phy. Lett., 63, 1915 (1993).
7. 4/Ar Plasma", J. Vac. Sci. Techno. A 18(3), (2000), pp 864-872.
8. J. Hong, A. Granier, C. Leteinturier, M.C. Peginon, "Measurements of rf bias effects in a dual electron cyclotron resonance- rf methane plasma using the langmuir probe method', J. Vac. Sci. Technolog. A 18(2), (2000), p 497-502.