Feasibility study of printing sub 100 nm with arf lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4346, Issue 1, 2001, Pages 214-221

  Kim, Seok Kyun ^a   Hong, Jong Gyun ^a   Park, Joo On ^a   Yoo, Tea Jun ^a   Hyun, Yoon Suk ^a   Bok, Cheol Kyu ^a   Shin, Ki Soo ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

Arf lithography; Id bias; Linearity; Resist thermal flow; Ret; Sub 100 nm printing

Indexed keywords

ANTIREFLECTION COATINGS; COMPUTER SIMULATION; LIGHTING; OPTICAL RESOLVING POWER; PRINTING; TRANSISTORS;

RESIST THERMAL FLOW;

PHOTORESISTS;

EID: 0035759056     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.435721     Document Type: Article

References (6)

1. K.Y. Kim, H.E. Kim, I.H. Lee and K.H. Baik, Microlithography world, autumn, 6 (1995).
2. S.K.Kim, Y.S.Kim, J.S.Kim, C.K.Bok, Y.M.Ham and K.H.Baik, SPIE Vol. 4000, 435 (2000).
3. C.N. Ahn, H.B. Kim, and K.H. Baik, Proc. SPIE Vol.3334, 752 (1998).
4. D.S. Nam et al, SPIE Vol. 3334, 117 (1998).
5. A.M.Goethals et al, SPIE Vol. 3679, 278 (1999).
6. S.H.Lee et al, SPIE Vol. 3679, 290 (1999).