Rigorous electromagnetic simulation applied to alignment systems

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4346, Issue 2, 2001, Pages 1533-1540

  Deng, Yunfei ^a   Pistor, Tom ^a   Neureuther, Andrew R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Alignment; Electromagnetic scattering; Line edge profile; Multiple wavelength

Indexed keywords

BENCHMARKING; BOUNDARY CONDITIONS; COMPUTER SIMULATION; ELECTROMAGNETIC WAVE SCATTERING; IMAGING SYSTEMS; RAY TRACING; REFRACTIVE INDEX;

ELECTROMAGNETIC SIMULATION;

LITHOGRAPHY;

EID: 0035758364     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.435695     Document Type: Conference Paper

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