A Novel Platform for Production-worthy ArF Resist

Journal of Photopolymer Science and Technology

Volumn 14, Issue 3, 2001, Pages 363-371

  Kim, Hyun Woo ^a   Choi, Sang Jun ^a   Jung, Dong Won ^a   Lee, Sook ^a   Lee, Sung Ho ^a   Kang, Yool ^a   Woo, Sang Gyun ^a   Moon, Joo Tae ^a   Kavanagh, Robert ^b   Barclay, George ^b   Orsula, George ^b   Mattia, Joe ^b   Caporale, Stefan ^b   Adams, Tim ^b   Tanaka, Tsutomu ^b   Kang, Doris ^b  

^a SAMSUNG Electronics   (South Korea)

^b SHIPLEY COMPANY   (United States)

Author keywords

ArF; Chemically amplified resist; Lithography; Photoresist; VEMA

Indexed keywords

ACRYLIC ACID; ALKENE; COPOLYMER; MALEIC ANHYDRIDE; MONOMER; OXIDE; POLYMER; POLYMETHACRYLIC ACID DERIVATIVE;

ADHESION; ARTICLE; DISSOLUTION; EXCIMER LASER; ILLUMINATION; SYNTHESIS; TECHNOLOGY;

EID: 0035755569     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.14.363     Document Type: Article

References (10)