Pattern transfer process using spun-on carbon film for KrF and ArF lithography

Journal of Photopolymer Science and Technology

Volumn 14, Issue 3, 2001, Pages 439-443

  Sato, Yasuhiko ^a   Shiobara, Eishi ^a   Matsunaga, Kentaro ^a   Shibata, Tsuyoshi ^a   Abe, Junko ^a   Hayashi, Hisataka ^a   Ohiwa, Tokuhisa ^a   Kasai, Mayumi ^a   Hachiya, Takayo ^a   Onishi, Yasunobu ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

ArF lithography; Bottom antireflective coating (BARC); KrF lithography; Pattern transfer; Spun on carbon film; Thinner resist

Indexed keywords

ARGON; CARBON; FLUORIDE; KRYPTON;

ARTICLE; CHEMICAL COMPOSITION; FILM; OXIDATION; PERFORMANCE; REACTION ANALYSIS; SPECTRAL SENSITIVITY; THERMAL ANALYSIS;

EID: 0035755029     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.14.439     Document Type: Article

References (4)