Organic-inorganic hybrid type electron beam resist

Journal of Photopolymer Science and Technology

Volumn 14, Issue 2, 2001, Pages 185-188

  Tamai, Toshiyuki ^a   Matsuura, Yukihito ^b   Matsukawa, Kimihiro ^a   Inoue, Hiroshi ^a   Hamamoto, Tetsuya ^a,b   Toyota, Hiroshi ^a   Satoh, Kazuo ^b  

^a OSAKA MUNICIPAL TECHNICAL RESEARCH INSTITUTE   (Japan)

^b OSAKA SCIENCE AND TECHNOLOGY CENTER   (Japan)

Author keywords

EB Resist; Lithography; Organic Inorganic Hybrid; Reactive Ion Etching; Sol Gel Process

Indexed keywords

ACRYLIC ACID DERIVATIVE;

ARTICLE; DEGRADATION; ELECTRON BEAM; FILM; HEAT TOLERANCE; MISCIBILITY;

EID: 0035747050     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.14.185     Document Type: Article

References (10)