DUV hardened layer of resist dot pattern detected by tip indentation method

Journal of Photopolymer Science and Technology

Volumn 14, Issue 5, 2001, Pages 749-750

  Kawai, Akira ^a   Kawakami, Yoshiaki ^a  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

Atomic force microscope; Collapse; DUV curing; Hardening; Indentation

Indexed keywords

POLYMER; SILICON NITRIDE;

ADHESION; ARTICLE; ATOMIC FORCE MICROSCOPY; HEAT TOLERANCE; IMAGING; SCANNING ELECTRON MICROSCOPY; SCANNING PROBE MICROSCOPY; SURFACE PROPERTY; ULTRAVIOLET RADIATION;

EID: 0035746983     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.14.749     Document Type: Article

References (6)