Monte carlo simulation of electron scattering trajectories in low-energy electron beam lithography

Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors

Volumn 22, Issue 12, 2001, Pages 1519-1524

  Ren, Li Ming ^a   Chen, Bao Qin ^a  

^a INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

Author keywords

Electron beam lithography; Low energy electron scattering; Monte Carlo method

Indexed keywords

COMPUTER SIMULATION; ELECTRON SCATTERING; MONTE CARLO METHODS; TRAJECTORIES;

BETHE FORMULA; LOW ENERGY ELECTRON SCATTERING; MOTT CROSS SECTION; MULTILAYER AND POLYBASIC MEDIUM;

ELECTRON BEAM LITHOGRAPHY;

EID: 0035740837     PISSN: 02534177     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (9)