Feedback control of thin film growth in an HPCVD reactor via reduced order models

Proceedings of the IEEE Conference on Decision and Control

Volumn 2, Issue , 2001, Pages 1577-1582

  Banks, H Thomas ^a   Beeler, S C ^a   Kepler, G M ^a   Tran, H T ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; MATHEMATICAL MODELS; RICCATI EQUATIONS; SURFACE REACTIONS; THIN FILMS;

HIGH PRESSURE CHEMICAL VAPOR DEPOSITION (HPCVD) REACTORS;

FEEDBACK CONTROL;

EID: 0035713313     PISSN: 01912216     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)

1. Reduced order modeling and control of thin film growth in an HPCVD reactor
2. Reduced order model compensator control of species transport in a CVD reactor
3. Representation of GaP formation by a reduced order surface kinetics model using p-polarized reflectance measurements
4. State estimation and tracking control of nonlinear dynamical systems
5. Feedback control methodologies for nonlinear systems
6. xP film growth by p-polarized reflectance
7. ∞ control via the state-dependent Riccati equation technique: Part 1. Theory