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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 12, 2001, Pages 6965-6971

Dynamic behavior of sputtering of tungsten implanted in carbon

(2) Ohya, Kaoru a Kawakami, Retsuo a

a UNIVERSITY OF TOKUSHIMA (Japan)

Author keywords

Carbon; Depth profile; Diffusion; Implantation; Monte Carlo simulation; Sputtering; Tungsten

Indexed keywords

APPROXIMATION THEORY; CALCULATIONS; CARBON; COMPOSITION; COMPUTER SIMULATION; DEPOSITION; DIFFUSION; DYNAMICS; ION IMPLANTATION; MONTE CARLO METHODS; TUNGSTEN;

DEPTH PROFILE; INCIDENT ENERGY; TUNGSTEN IMPLANTATION;

SPUTTERING;

EID: 0035710343 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.40.6965 Document Type: Article

Times cited : (2)

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