Enhancement factor in the emission intensities excited by radiofrequency-powered glow discharge plasma associated with bias-current introduction

ISIJ International

Volumn 41, Issue 12, 2001, Pages 1488-1493

  Wagatsuma, Kazuaki ^a   Matsuta, Hideyuki ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Copper; D.c. bias current; Enhancement factor; Excitation energy; Glow discharge optical emission spectrometry; R.f. plasma

Indexed keywords

ELECTRIC CURRENTS; LIGHT EMISSION; PLASMAS; PRESSURE EFFECTS; SPECTROMETRY; STEELMAKING;

EXCITATION ENERGY; PLASMA GASES;

GLOW DISCHARGES;

EID: 0035698592     PISSN: 09151559     EISSN: None     Source Type: Journal    
DOI: 10.2355/isijinternational.41.1488     Document Type: Article

References (8)

1. Atomic Energy Levels