Anisotropic etching and electrochemical etch-stop properties of silicon in TMAH:IPA:Pyrazine solutions

Metals and Materials International

Volumn 7, Issue 6, 2001, Pages 643-649

  Chung, Gwiy Sang ^a  

^a Dongseo University   (South Korea)

Author keywords

Anisotropic etching; Electrochemical etch stop; Etching rate; Flatness; Microdiaphragm; Passivation potential; Silicon; TMAH:IPA:Pyrazine solutions; Undercutting

Indexed keywords

ANISOTROPIC ETCHING; ANISOTROPY; AROMATIC COMPOUNDS; PASSIVATION; SILICON; SILICON COMPOUNDS; SINGLE CRYSTALS;

ELECTRO CHEMICAL ETCH STOPS; ETCHING RATE; FLATNESS; MICRODIAPHRAGM; PASSIVATION POTENTIALS; PYRAZINES; UNDERCUTTING;

SILICON WAFERS;

EID: 0035658309     PISSN: 12259438     EISSN: None     Source Type: Journal    
DOI: 10.1007/bf03179265     Document Type: Article

References (23)

1. K. E. Petersen, IEEE Proc. 70, 420 (1982).
2. O. Tabata, R. Asahi, H. Funabashi and S. Sugiyama, Tech. Dig. IEEE Int. Conf. on Solid-State Sensors & Actuators, p. 811, IEEE, USA (1991).
3. M. Hirata, K. Suzuki and H. Tanigawa, Sensors & Actuators A 13, 63 (1988).
4. Y. Linden, L. Tenerz, J. Tiren and B. Hok, Sensors & Actuators A 16, 67 (1989).
5. H. Seidel, L. Csepregi, A. Heuberger and H. Baumgartel, J. Electrochem. Soc. 137, 3612 (1990).
6. I. J. Murazkiewicz, IBM J. Res. & Deve. 16, 523 (1982).
7. B. K. Ju, B. J. Ha, C. J. Kim, M. H. Oh and K. H. Tchah, Jpn. J. Appl. Phys. 31, 3489 (1992).
8. M. Mehregany and S. D. Senturia, Sensors & Actuators A 13, 375 (1988).
9. U. Schnakenberg, W. Benecke, B. Lochel, S. Ullerich and P. Lange, Sensors & Actuators A 25, 1 (1991).
10. O. Tabata, R. Asahi and S. Sugiyama, Tech. Dig. of the 9th Sensor Symp., p. 15, IEE, Japan (1990).
11. O. Tabata, Sensors & Actuators A 53, 335 (1996).
12. Z. Qingxin, L. Litian and L. Zhijian, Sensors & Actuators A 56, 251 (1996).
13. A. Merlos, M. Acero, M. H. Bao, J. Bausells and J. Esteve, Sensors & Actuators A 37, 37 (1993).
14. E. Steinsland, M. Nese, A. Hanneborg, R. W. Bernstein, H. Sandmo and G. Kittilsland, Sensors & Actuators A 54, 728 (1996).
15. G. S. Chung, Sensors & Actuators A 39, 241 (1993).
16. M. C. Acero, J. Esteve, C. Burrer and A. Gotz, Sensors & Actuators A 46, 22 (1995).
17. Y. Nemirovsky and A. El-Bahar, Sensors & Actuators A 75, 205 (1999).
18. E. D. Palik, J. W. Faust, H. F. Gray and R. F. Greene, J. Electrochem. Soc. 129, 2051 (1982).
19. J. G Elizalde, S. Olaizola, G. Bistue, E. Castano, A. G. Alonso and F. J. Gracia, Sensors & Actuators A 62, 668 (1996).
20. G. S. Chung, Sensors & Materials 12, 1 (2000).
21. P. Meakin and J. M. Deutch, J. Chem. Phys. 85, 2320 (1986).
22. B. Kloeck, S. D. Collins, N. F. D. Rooij and R. L. Smith, IEEE Electron Devices ED-36, 663 (1989).
23. M. Hirata, K. Suzuki and H. Tanigawa, Sensors & Actuators 13, 63 (1988).