Anomalous diffusion of Mo implanted into aluminium

Chinese Physics Letters

Volumn 18, Issue 1, 2001, Pages 77-79

  Zhang, Tong He ^a   Wu, Yu Guang ^a   Deng, Zhi Wei ^a   Qian, Wei Dong ^a  

^a BEIJING NORMAL UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ALUMINUM ALLOYS; BINARY ALLOYS; IONS; MOLYBDENUM; MOLYBDENUM ALLOYS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; X RAY DIFFRACTION;

ANOMALOUS DIFFUSION; ATOMIC CONCENTRATION; C X-RAY DIFFRACTION; COLLISION CASCADE; ELEVATED TEMPERATURE; HIGH DOSE; ION DOSE; ION FLUXES; X-RAY DIFFRACTION SPECTRUM;

DIFFUSION;

EID: 0035578620     PISSN: 0256307X     EISSN: None     Source Type: Journal    
DOI: 10.1088/0256-307X/18/1/327     Document Type: Article

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